• 
  T. Rasoanarivo, C. Mannequin, F. Roqueta, M. Boufnichel, A. Rhallabi. Dynamic global model of Cl2/Ar plasmas: Applicability to atomic layer etching processes. Journal of Vacuum Science & Technology A, 2024, 42 (6), ⟨10.1116/6.0003932⟩. ⟨hal-04798733⟩
• 
  C Cardinaud, A Girard, J Nos, T Tillocher, R Dussart. An insight on plasma-surface interaction mechanisms during cryoetching in SiF4-O2, using in situ XPS. 48th Micro and Nano Engineering (MNE), Michael Kraft; Jean-Francois de Marneffe, Sep 2022, Leuven, Belgium. ⟨hal-04681098⟩
• 
  Thibaut Meyer, Aurélie Girard, Christophe Cardinaud, Marek Bouška, Emeline Baudet, et al.. Investigation of plasma species, etch products and surface modification during etching of Ge, Sb and Se-based materials in CH 4 -H 2 -Ar plasmas. 25th International Symposium on Plasma Chemistry (ISPC25), May 2023, Kyoto, Japan. ⟨hal-04675793⟩
• 
  T Meyer, A Girard, M Bouska, E Baudet, M Baillieul, et al.. Investigation of plasma species, etch products and surface modification during etching of Ge, Sb and Se-based materials in CH4-H2-Ar plasmas. 25th International Symposium on Plasma Chemistry (ISPC25), Takayuki Watanabe - Kyushu University; Satoshi Hamaguchi - Osaka University, May 2023, Kyoto, Japan. ⟨hal-04675788⟩
• 
  Christophe Cardinaud, Felipe Cemin, Aurélie Girard, Gaëlle Antoun, Thomas Tillocher, et al.. Limits and interest of a low surface temperature for plasma etching processes. Plasma Etch and Strip for Microelectronics - Plasma Cryoetching Processes, Jun 2024, Louvain (Leuven), Belgium. ⟨hal-04674902⟩
• 
  S Chouteau, A Durocher-Jean, A Granier, M Richard-Plouet, L Stafford. Time-resolved analysis of Ar metastable and electron populations in low-pressure misty plasma processes using optical emission spectroscopy. Plasma Sources Science and Technology, 2024, 33 (7), pp.075016. ⟨10.1088/1361-6595/ad5d11⟩. ⟨hal-04672943⟩
• 
  Simon Chouteau, L. Stafford, Agnès Granier, Antoine Goullet, Mireille Richard-Plouet. Handling Nanoparticle Content in Nanocomposite Thin Films Deposited by Misty Plasma Processes through Controlled Flash Boiling Atomization. Langmuir, 2024, 40 (6), pp.3015-3023. ⟨10.1021/acs.langmuir.3c03176⟩. ⟨hal-04549282⟩
• 
  Issraa Shahine, Quentin Hatte, Maxime Harnois, Pierre-Yves Tessier. Large Area Freestanding Au Nanoporous Ultrathin Films Transfer Printed on Bendable Substrates and 3D Surfaces for Flexible Electronics. ACS Applied Electronic Materials, 2024, 6 (4), pp.2281-2288. ⟨10.1021/acsaelm.3c01771⟩. ⟨hal-04552765⟩
• 
  Julien Godet, Gwénaël Massé, Issraa Shahine, Quentin Hatte, Hadi Bahsoun, et al.. Experimental characterization of quasi-2-dimension nanoporous gold ultra-thin film from nano to micro length scale. Thin Solid Films, 2023, 787, pp.140136. ⟨10.1016/j.tsf.2023.140136⟩. ⟨hal-04372632⟩
• 
  C Villeneuve-Faure, Maria Mitronika, A P Dan, Laurent Boudou, William Ravisy, et al.. Nanoscale dielectric properties of TiO2 in SiO2 nanocomposite deposited by hybrid PECVD method. Nano Express, 2024, 5 (1), pp.015010. ⟨10.1088/2632-959x/ad220d⟩. ⟨hal-04549301⟩
• 
  Bart Vermang, Guy Brammertz, Marc Meuris, Thomas Schnabel, Erik Ahlswede, et al.. Wide band gap kesterite absorbers for thin film solar cells: potential and challenges for their deployment in tandem devices. Sustainable Energy & Fuels, 2019, 3 (9), pp.2246-2259. ⟨10.1039/c9se00266a⟩. ⟨hal-02291073⟩
• 
  Pascal Bargiela, Vincent Fernandez, Christophe Cardinaud, John Walton, Mark Greiner, et al.. Towards a reliable assessment of charging effects during surface analysis: Accurate spectral shapes of ZrO2 and Pd/ZrO2 via X-ray Photoelectron Spectroscopy. Applied Surface Science, 2021, 566, pp.150728. ⟨10.1016/j.apsusc.2021.150728⟩. ⟨hal-03355769⟩
• 
  Allan Lebreton, Marie-Paule Besland, Pierre-Yves Jouan, Tatiana Signe, Cédric Mannequin, et al.. Control of microstructure and composition of reactively sputtered vanadium nitride thin films based on hysteresis curves and application to microsupercapacitors. Journal of Vacuum Science & Technology A, 2024, 42 (2), pp.023405. ⟨10.1116/5.0177028⟩. ⟨hal-04423908⟩
• 
  Pascale Diener, Etienne Janod, B. Corraze, M. Querre, C. Adda, et al.. How a dc Electric Field Drives Mott Insulators Out of Equilibrium. Physical Review Letters, 2018, 121 (1), ⟨10.1103/PhysRevLett.121.016601⟩. ⟨hal-01848488⟩
• 
  Michael Rodriguez-Fano, Mohamad Haydoura, Julien Tranchant, Etienne Janod, Benoît Corraze, et al.. Enhancing the Resistive Memory Window through Band Gap Tuning in Solid Solution (Cr1–xVx)2O3. ACS Applied Materials & Interfaces, 2023, 15 (47), pp.54611-54621. ⟨10.1021/acsami.3c09387⟩. ⟨hal-04361024⟩
• 
  J. Zgheib, L. Berthelot, J. Tranchant, N. Ginot, M.-P. Besland, et al.. Electron-enhanced high power impulse magnetron sputtering with a multilevel high power supply: Application to Ar/Cr plasma discharge. Journal of Vacuum Science & Technology A, 2023, 41 (6), pp.063003. ⟨10.1116/6.0002857⟩. ⟨hal-04299303⟩
• 
  Pablo Stoliar, Julien Tranchant, Benoît Corraze, Etienne Janod, Marie-Paule Besland, et al.. A Leaky-Integrate-and-Fire Neuron Analog Realized with a Mott Insulator. Advanced Functional Materials, 2017, 27 (11), ⟨10.1002/adfm.201604740⟩. ⟨hal-01720928⟩
• 
  Etienne Janod, Julien Tranchant, Benoît Corraze, Madec Querré, Pablo Stoliar, et al.. Resistive Switching in Mott Insulators and Correlated Systems. Advanced Functional Materials, 2015, 25 (40), pp.6287--6305. ⟨10.1002/adfm.201500823⟩. ⟨hal-01233571⟩
• 
  F. Bailly, T. David, T. Chevolleau, Maxime Darnon, N. Posseme, et al.. Roughening of porous SiCOH materials in fluorocarbon plasmas. Journal of Applied Physics, 2010, 108 (1), pp.014906. ⟨10.1063/1.3446820⟩. ⟨hal-00848955⟩
• 
  Milène Fréneau, Raphaël Blanchet, Sandro Benichi, Mary-Adel Mrad, Surya Prakash Rao Batta, et al.. Rare coding variants in CTSO , a potential new actor of arterial remodeling, are associated to familial intracranial aneurysm. 2023. ⟨hal-03999154⟩

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